Title | Characterisation of ZnS:Mn thin films by Rietveld refinement of Bragg-Brentano X-ray diffraction patterns |
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Publication Type | Articolo su Rivista peer-reviewed |
Year of Publication | 1999 |
Authors | Tagliente, M.A., Penza Michele, Gusso M., and Quirini A. |
Journal | Thin Solid Films |
Volume | 353 |
Pagination | 129-136 |
ISSN | 00406090 |
Keywords | Bragg-Brentano X ray diffraction patterns, Crystal microstructure, evaporation, Magnetron sputtering, Rietveld method, Semiconducting films, Structure (composition), Thermal vacuum evaporation, Thickness measurement, X ray diffraction analysis, Zinc sulfide |
Abstract | In this work, we investigate ZnS:Mn polycrystalline thin films deposited onto glass substrates coated by tin or bismuth buffer layers, by using X-ray diffraction in the conventional Bragg-Brentano geometry. The ZnS:Mn thin films were deposited via radio frequency magnetron sputtering from a ZnS:Mn target (0.1% atomic Mn) and the buffer layers by thermal vacuum evaporation. A suitable algorithm were introduced in the Rietveld routine for powder diffraction data in order to model the X-ray diffraction patterns of the multilayers. The experimental results reveal that the microstructure and the crystalline phase of the ZnS films depend decisively on the structural and microstructural properties of the buffer layers. |
Notes | cited By 10 |
URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0033327323&doi=10.1016%2fS0040-6090%2899%2900395-8&partnerID=40&md5=117f71a0fafe2c3fd9dc80f556f622ff |
DOI | 10.1016/S0040-6090(99)00395-8 |
Citation Key | Tagliente1999129 |