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Characterisation of ZnS:Mn thin films by Rietveld refinement of Bragg-Brentano X-ray diffraction patterns

TitoloCharacterisation of ZnS:Mn thin films by Rietveld refinement of Bragg-Brentano X-ray diffraction patterns
Tipo di pubblicazioneArticolo su Rivista peer-reviewed
Anno di Pubblicazione1999
AutoriTagliente, M.A., Penza Michele, Gusso M., and Quirini A.
RivistaThin Solid Films
Volume353
Paginazione129-136
ISSN00406090
Parole chiaveBragg-Brentano X ray diffraction patterns, Crystal microstructure, evaporation, Magnetron sputtering, Rietveld method, Semiconducting films, Structure (composition), Thermal vacuum evaporation, Thickness measurement, X ray diffraction analysis, Zinc sulfide
Abstract

In this work, we investigate ZnS:Mn polycrystalline thin films deposited onto glass substrates coated by tin or bismuth buffer layers, by using X-ray diffraction in the conventional Bragg-Brentano geometry. The ZnS:Mn thin films were deposited via radio frequency magnetron sputtering from a ZnS:Mn target (0.1% atomic Mn) and the buffer layers by thermal vacuum evaporation. A suitable algorithm were introduced in the Rietveld routine for powder diffraction data in order to model the X-ray diffraction patterns of the multilayers. The experimental results reveal that the microstructure and the crystalline phase of the ZnS films depend decisively on the structural and microstructural properties of the buffer layers.

Note

cited By 10

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0033327323&doi=10.1016%2fS0040-6090%2899%2900395-8&partnerID=40&md5=117f71a0fafe2c3fd9dc80f556f622ff
DOI10.1016/S0040-6090(99)00395-8
Citation KeyTagliente1999129